Comparing Occupational AI Exposure Measures with Platform-Derived Usage Traces: Quantity, Mode, and Sample Selection
저자 표시: Author notes: 굵은 글씨: 김용희Bold: Yonghee Kim 외: 공저자 명단 일부만 표기et al.: co-author list not fully listed
심사 중 · 2026-08Under review · 2026-08
요약Summary
연구 원고의 제목과 진행 상태를 안내합니다. 내용과 결과 소개는 검토 후 갱신합니다.
This record provides the manuscript title and progress status. A verified account of its contents and findings will be added after review.
원고 안내
현재는 제목·저자·진행 상태를 안내합니다. 분석 방법·표본·수치·결과에 관한 설명은 검토를 마친 뒤 제공합니다.
Manuscript information
This page currently provides the title, authors, and progress status. Methods, samples, numerical estimates, and findings will be described after review.
서지 정보Bibliographic information
- 상태Status
- 심사 중 · 2026-08Under review · 2026-08
- 원고 날짜Manuscript date
- 2026
인용하기Cite APA · BibTeX
APA
Kim, Y., et al. (2026). Comparing Occupational AI Exposure Measures with Platform-Derived Usage Traces: Quantity, Mode, and Sample Selection [Working paper].
BibTeX
@unpublished{kim2026-ai-exposure,
author = {Kim, Y. and others},
title = {Comparing Occupational {AI} Exposure Measures with Platform-Derived Usage Traces: Quantity, Mode, and Sample Selection},
year = {2026},
note = {Working paper}
}